 |
| A panel discussion at SPIE Advanced Lithography + Patterning on the future of EUV lithography. From left to right: Mark Slezak, JSR (Japan); Jan van Schoot, ASML (Netherlands); Emily Gallagher, imec (Belgium); Frank Abboud, Intel (USA); Youngseog Kang, Samsung (RoK); and Andreas Erdmann, Fraunhofer IISB (Germany). |
| © 2024 SPIE Europe |
|
